SPring-8/SACLA Research Report
Online ISSN : 2187-6886
Section A
The AR-XPS Study on Depth Profile of N Atom in Oxynitride Film Formed on 4H-SiC by Radical Nitridation
Hiroshi Nohira, Hazuki Okada, Akito Takashima, Takayuki Muro
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Keywords: AR-XPS, SiON/SiC, 2013A1698, 2013B1774, BL27SU
JOURNAL OPEN ACCESS

2018 Volume 6 Issue 1 Pages 13-16

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[in Japanese]
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