Preprints of the National Meeting of JWS
Preprints of the National Meeting of JWS
Session ID : 203
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Host: Japan Welding Society

Resistance reduction of Cu alloy interconnects in the contact with ITO transparent conductive films
*Kazuhiro Ito, Wataru Nakagawa, Takashi Onishi, Yasuharu Shirai, Masanori Murakami
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Keywords: Cu(Ti) films, ITO films, Contact resistance, Ti oxides
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[in Japanese]
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© 2013 by Japan Welding Society
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