Journal of the Japan Society of Powder and Powder Metallurgy
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
Fabrication of Bi-Te Thermoelectric Device by Radio Frequency Sputtering Target Prepared by MA-PCS Process
Keizo KobayashiAkihiro MatsurmotoKimihiro OzakiToshiyuki NishioRyuta Kusakabe
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JOURNAL OPEN ACCESS

2002 Volume 49 Issue 10 Pages 928-932

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Abstract
An n-type thermoelectric film of Bi2Te2.7Se0.3 was fabricated by radio frequency sputtering. The target for the sputtering was prepared by mechanical alloying (MA) and pulsed current sintering (PCS) process. The single phase of Bi2Te3 including Se was obtained by a planetary ball milling of elementary Bi powder, Te powder and Se powder for 18 ks. The obtained MA powder was consolidated by PCS into cylindrical target of 50 mm in diameter and 4 mm thickness at 643 K under a pressure of 13 MPa. The sintered Bi2Te2.7Se0.3 was joined to Cu backing plate with In for an insertion by PCS process.
The thin film of Bi2Te2.7Se0.3 was fabricated on a polyimide substrate by RF sputtering. This film was amorphous state and crystallized at about 623 K. The performance of the thermoelectric module with 5 thermoelectric film devices was 56 mV in voltage and 0.07 mA in current at 20 K of the difference between heating side temperature and cooling side temperature.
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