Dense sintered materials (>99% of theoretical) consisting of three-layer structures with the compositions of ZrO₂(2Y)/MOSi₂=(60/40:A)/(80/20:B)/(60/40:A) mol% have been able to be fabricated by hot isostatic pressing at 1400°C for 2 h under 196 MPa. The materials show an anisotropy in overall electric resistivities measured in the perpendicular and parallel directions for the laminated interfaces: the former and latter resistivities correspond to insulating (ρ⊥≈1×10¹¹Ω⋅cm) and metallic (ρ _??_ ≈1×10^-4 Ω⋅cm) materials, respectively. The fracture toughness (KIc) is much affected by the residual stress estimated to be as much as ≈150 MPa at the interfaces. The residual stress acts as compressive and tensile stresses in the layers A and B, respectively.