Journal of the Japan Society of Powder and Powder Metallurgy
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
Preparation of Rutile Films on Sapphire (1102) by MOCVD and their Optical Properties
Xian-tong ChenHisanori YamaneKiyoshi KayaToshio Hirai
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JOURNAL OPEN ACCESS

1992 Volume 39 Issue 2 Pages 122-125

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Abstract
Rutile films were prepared on sapphire (1102) substrates by chemical vapor deposition using titanium tetraisopropoxide {Ti[OCH(CH3)2]4} as a precursor. The Elms showed preferred orientation of (101) parallel to the substrate plane. The epitaxial relationship between the film and the substrate was found by X-ray pole figure analysis. Refractive index nealy equal to that of the single crystal of rutile was measrued for the epitaxial film prepared at 800°C.
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