A New Detection Method of Point Defects in Silicon Dioxide Thin Films

IEEJ Transactions on Fundamentals and Materials

Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205

A New Detection Method of Point Defects in Silicon Dioxide Thin Films

Yoshimichi Ohki, Keisuke Ishii, Kwang Soo Seol, Hiroyuki Nishikawa

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JOURNAL FREE ACCESS

1996 Volume 116 Issue 5 Pages 387-391

DOI https://doi.org/10.1541/ieejfms1990.116.5_387

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