IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Paper
Investigation of Spatial Profile Control of Electron Density in the Rectangular-Type Surface Wave Plasma Apparatus with Multi Dielectric-Windows
Takayuki TobaToshifumi ItagakiMakoto Katsurai
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2005 Volume 125 Issue 12 Pages 969-976

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Abstract
The surface wave plasma (SWP) processing apparatus has been permitted to generate high-density and uniform plasmas via 2.45GHz microwave without external magnetic fields. To enlarge the processing area of the SWP apparatus, special configuration was investigated for a rectangular-type surface wave plasma apparatus that is equipped with multi dielectric-windows. The experimental investigation of the discharge characteristics of this apparatus with four windows (each size with 10cm × 10cm) has been carried out. To improve electron density uniformity, two methods have been surveyed. One is to insert quartz plates between metallic window frames of the chamber to make the boundary surface between plasma flat, and the other is to place parallel conductor plates on the window surface. The combination of these methods permits the reduction of nonuniformity of the spatial distribution of the electron density less than ± 6%.
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© 2005 by the Institute of Electrical Engineers of Japan
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